Acta Phys. -Chim. Sin. ›› 2010, Vol. 26 ›› Issue (03): 649-653.doi: 10.3866/PKU.WHXB20100314

• CATALYSIS AND SURFACE STRUCTURE • Previous Articles     Next Articles

Microstructure and Micromechanical Properties of Chitosan Films under Different Drying Conditions

ZHAO Hong-Xia, JIN Hua, CAI Ji-Ye   

  1. College of Life Science, Jinan University, Guangzhou 510632, P. R. China; Faculty of Chemical Engineering and Light Industry, Guangdong University of Technology, Guangzhou 510090, P. R. China
  • Received:2009-08-29 Revised:2009-11-13 Published:2010-03-03
  • Contact: CAI Ji-Ye E-mail:tjycai@jnu.edu.cn

Abstract:

Chitosan films were prepared by wet casting followed by natural withering (NW), vacuum drying (VD), and infrared drying (ID). Atomic force microscope (AFM) was used to study the effects of these three drying methods on the microstructural and micromechanical properties of the chitosan films. Results showed that VD and ID effectively enhanced the planeness and evenness of the chitosan films. The average roughness of the VD films ((5.47±1.34) nm) and the ID films ((2.79±0.93) nm) were lower than that of the NWfilms ((30.67±8.06) nm). The adhesion force of the ID films ((2595.0±68.5) pN) was larger than that of the NWfilms ((982.6±149.3) pN) and the VD films ((1817.9±279.2) pN). The Youngs modulus of the ID films ((158.8±15.2) MPa) was less than that of the NW films ((204.3±22.7) MPa) and the VD films ((195.8±14.6) MPa).

Key words: Chitosan, Natural withering, Vacuumdrying, Infrared drying, Atomic force microscope, Micromechanics

MSC2000: 

  • O647