A Model of Stoichiometric Displacement for the Adsorption of Benzoic Acid and Benzene by Silica Gel from Cyclohexane Solution
CHEN Yu-yin; LIU Fan; LIU Yong-chun
Acta Phys. -Chim. Sin. . 2005, (11): 1211 -1216 .  DOI: 10.3866/PKU.WHXB20051104