Influence of Deposition Temperature on the SiNx:H Film Prepared by Plasma Enhanced Chemical Vapor Deposition
WEN Zhen-Li, CAO Xiao-Ning, ZHOU Chun-Lan, ZHAO Lei, LI Hai-Ling, WANG Wen-Jing
Acta Physico-Chimica Sinica . 2011, (06): 1531 -1536 .  DOI: 10.3866/PKU.WHXB20110632