总气压与Ar/O2流量比对直流对向靶磁控溅射TiO2薄膜光催化性能的影响

doi:10.3866/PKU.WHXB201207061

物理化学学报 >> 2012, Vol. 28 >> Issue (09): 2162-2168.doi: 10.3866/PKU.WHXB201207061

总气压与Ar/O₂流量比对直流对向靶磁控溅射TiO₂薄膜光催化性能的影响

陈芃^1,2, 谭欣¹, 于涛³

1. 天津大学环境科学与工程学院,天津300072;
2. 国家海洋局天津海水淡化与综合利用研究所, 天津 300192;
3. 天津大学化学工程学院,天津 300072

收稿日期:2012-03-30 修回日期:2012-07-05 发布日期:2012-08-02
通讯作者: 于涛 E-mail:lisat.yu@gmail.com
基金资助:
国家重点基础研究发展规划项目(973) (2012CB720100)和国家自然科学基金(20973124)资助

Effects of Total Pressure and Ar/O₂ Flow Ratios on Photocatalytic Properties of TiO₂ Thin Films Deposited by Direct Current Facing-Target Magnetron Sputtering

CHEN Peng^1,2, TAN Xin¹, YU Tao³

1. School of Environmental Science and Engineering, Tianjin University, Tianjin 300072, P. R. China;
2. Institute of Seawater Desalination and Multipurpose Utilization, State Oceanic Administration, Tianjin 300192, P. R. China;
3. School of Chemical Engineering, Tianjin University, Tianjin 300072, P. R. China

Received:2012-03-30 Revised:2012-07-05 Published:2012-08-02
Supported by:
The project was supported by the National Key Basic Research Program of China (973) (2012CB720100) and National Natural Science Foundation of China (20973124).

摘要/Abstract

摘要：

采用对向靶磁控溅射法在不同气压和Ar/O₂流量比条件下, 以氟化SnO₂ (FTO)导电玻璃为基底制备了多晶TiO₂薄膜. 台阶仪测量结果显示所制备TiO₂薄膜的平均厚度约为200 nm. 随着溅射气压的升高, TiO₂薄膜由锐钛矿与金红石混晶结构转变为纯锐钛矿结构. 分别采用场发射扫描电镜(FESEM)和原子力显微镜(AFM)分析了不同气压和Ar/O₂流量比对TiO₂薄膜表面形貌的影响, 结果显示TiO₂薄膜的表面粗糙度随溅射总气压和Ar/O₂流量比的增加而增大. 以初始浓度为100×10^-6 (体积分数)的异丙醇(IPA)气体为目标物检测所制备TiO₂薄膜的光催化性能, 并分析该气相光催化反应的机理, 在紫外照射条件下异丙醇先氧化为丙酮再被氧化为CO₂.当总溅射气压为2.0 Pa、Ar/O₂流量比为1:1时, 溅射所得TiO₂薄膜具备最优光催化活性并可在IPA降解反应中保持较高的催化活性和稳定性.

关键词: TiO₂薄膜, 对向靶磁控溅射, 总气压, Ar/O₂流量比, 异丙醇降解, 超亲水性

Abstract:

Polycrystalline TiO₂ thin films were prepared by direct current facing-target magnetron sputtering at different sputtering pressures and Ar/O₂ flow ratios. The average thickness of all prepared films was 200 nm, measured by surface roughness tester. With increase in sputtering pressure (p_tot), the prepared films changed from mixtures of anatase and rutile phases to pure anatase. The influences of different sputtering pressures and Ar/O₂ flow ratios on surface morphology of prepared films were investigated by field emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM). The film surface was found to become rougher with increasing pressure and Ar/O₂ flow ratios. Photocatalytic activities of the prepared TiO₂ thin films were investigated by decomposition of iso-propanol (IPA) with initial concentration of 100×10^-6 (volume fraction) under UV irradiation. The IPA was oxidized to acetone and further to carbon dioxide. TiO₂ thin film deposited at 2.0 Pa with an Ar/O₂ flow ratio of 1:1 showed the highest photocatalytic activity and maintained a high stability constant during the reaction.

Key words: TiO₂ thin film, Facing-target magnetron sputtering, Total pressure, Ar/O₂ flow ratio, iso-Propanol degradation, Superhydrophilicity

陈芃, 谭欣, 于涛. 总气压与Ar/O₂流量比对直流对向靶磁控溅射TiO₂薄膜光催化性能的影响[J]. 物理化学学报, 2012, 28(09), 2162-2168. doi: 10.3866/PKU.WHXB201207061

CHEN Peng, TAN Xin, YU Tao. Effects of Total Pressure and Ar/O₂ Flow Ratios on Photocatalytic Properties of TiO₂ Thin Films Deposited by Direct Current Facing-Target Magnetron Sputtering[J]. Acta Phys. -Chim. Sin. 2012, 28(09), 2162-2168. doi: 10.3866/PKU.WHXB201207061

链接本文: https://www.whxb.pku.edu.cn/CN/10.3866/PKU.WHXB201207061

https://www.whxb.pku.edu.cn/CN/Y2012/V28/I09/2162

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总气压与Ar/O₂流量比对直流对向靶磁控溅射TiO₂薄膜光催化性能的影响

Effects of Total Pressure and Ar/O₂ Flow Ratios on Photocatalytic Properties of TiO₂ Thin Films Deposited by Direct Current Facing-Target Magnetron Sputtering

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