物理化学学报 >> 1992, Vol. 8 >> Issue (04): 536-539.doi: 10.3866/PKU.WHXB19920422

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四甲基硅的多光子电离光谱和质谱

陆庆正; 施德恒; 余枝广; 马兴孝; 孔繁熬   

  1. 中国科学技术大学近代化学所，合肥 230026
  • 收稿日期:1991-04-28 修回日期:1991-09-28 发布日期:1992-08-15
  • 通讯作者:

Multiphoton Ionization Spectrum and Mass Measurement of Tetramethylsilane

Lu Qing-Zheng; Shi De-Heng; Yu Zhi-Guang; Ma Xing-Xiao; Kong Fan-Ao   

  1. Department of Modern Chemistry, University of Science and Technology of China, Hefei 230026
  • Received:1991-04-28 Revised:1991-09-28 Published:1992-08-15
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关键词: 多光子过程, 质谱检测, 四甲基硅

Abstract: MPI spectrum of Si(CH_3)_4 has been measured in the wavelength range of 410—370 nm. Most of the peaks with strong background were assigned to (2+1) ionization of Si atoms initiated from their ground state 3~3P_J and the first singlet state 3~1D_2. TOF mass spectra showed that Si~+, C_2~+ were the major products at lower laser energy, whereas more ions Si(CH_3)_n~+ (n=1—4), even silicon carbide ion C_3Si~+, appeared at higher energy.

Key words: Multiphoton, Mass detection, Tetramethylsilane