NiPd/Si界面常温扩散及硅化物形成的XPS证据
张国庆,刘冰,姚素薇,郭鹤桐,何菲,龚正烈
XPS Evidence for the Diffusion and Formation of Metal Silicide at Atmospheric Temperature on the Interface of NiPd/Si
Zhang Guo-Qing,Liu Bing,Yao Su-Wei,Guo He-Tong,He Fei,Gong Zheng-Lie
物理化学学报
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1997, (02): 164
-168
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DOI: 10.3866/PKU.WHXB19970212
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