沉积温度对等离子增强化学气相沉积法制备的SiNx:H薄膜特性的影响
闻震利, 曹晓宁, 周春兰, 赵雷, 李海玲, 王文静
Influence of Deposition Temperature on the SiNx:H Film Prepared by Plasma Enhanced Chemical Vapor Deposition
WEN Zhen-Li, CAO Xiao-Ning, ZHOU Chun-Lan, ZHAO Lei, LI Hai-Ling, WANG Wen-Jing
物理化学学报
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2011, (06): 1531
-1536
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DOI: 10.3866/PKU.WHXB20110632
