Acta Phys. -Chim. Sin. ›› 1999, Vol. 15 ›› Issue (08): 680-683.doi: 10.3866/PKU.WHXB19990803

• Communication • Previous Articles     Next Articles

Investigation on Surface State of TiO2 Nanoprticulate Film

Cao Ya-An, Xie Teng-Feng, Zhang Xin-Tong, Guan Zi-Sheng, Ma Ying, Wu Zhi-Yun, Bai Yu-Bai, Li Tie-Jin, Yao Jian-Nian   

  1. Institute of Photographic Chemistry,Chinese Academy of Sciences,Beijing 100101|Department of Chemistry,Jilin University,Changchun 130023
  • Received:1999-04-19 Revised:1999-06-03 Published:1999-08-15
  • Contact: Bai Yu-Bai


 TiO_2 nanoparticulate films were prepared by means of Plasma-enhanced Chemical Vapor Deposition (PECVD). By further surface treatment by TiCl_4 or O_2 plasma, films with different surface properties were obtained. It was found that treatment by TiCl4 plasma enhanced the amount of Ti3+ surface state and Ti dislocation of the film, detected by the surface photovoltage spectroscopy, while O_2 plasma surface treating enhanced its amount of O_2 surface state. It was also indicated by the H_2O adsorption experiment that film treated by O_2 plasma had larger separation efficiency for photogenerated carriers than the one treated by TiCl_4 plasma.

Key words: PECVD, TiO2 nanoparticulate film, SPS, Surface treatment, Surface state