Acta Phys. -Chim. Sin. ›› 2008, Vol. 24 ›› Issue (05): 805-809.doi: 10.3866/PKU.WHXB20080512

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Photoelectrochemical Study on the Complex of PASP and Tungstate as Inhibitors of Cupronickel B10’s Corrosion

ZHU Lv-Jun; XU Qun-Jie; CAO Wei-Min; WAN Zong-Yue; ZHOU Guo-Ding; LIN Chang-Jian   

  1. Department of Chemistry, Shanghai University, Shanghai 200444, P. R. China; Department of Environment Engieering, Shanghai University of Electric Power, Shanghai 200090, P. R. China; State Key Laboratory of Solid Surface Physical Chemistry, Xiamen University, Xiamen 361005, Fujian Province, P. R. China
  • Received:2007-12-05 Revised:2008-02-01 Published:2008-05-05
  • Contact: XU Qun-Jie

Abstract: Photoelectrochemical and AC impedance measurements were conducted to study the effects of environment-friendly inhibitors poly-aspartate(PASP), Na2WO4 and their complex on the corrosion of cupronickel B10 in a borax-buffer solution. The photoelectrochemical measurement results indicated that PASP or Na2WO4 increased the p-type photocurrent which came fromthe Cu2O layer on the B10 surface. It showed that the inhibitors increased the thickness of the Cu2O layer and decreased the corrosion speed. The optimal concentrations of PASP and Na2WO4 was 3 and 5 mg·L-1, respectively. Na2WO4 increased photocurrent more than mono PASP did. Combined use of PASP and Na2WO4 in a total concentration of 5 mg·L-1, when the mass ratio(PASP: Na2WO4) was 1:1 or 1:3, increased the photocurrent more than their individual use did. The bigger the photocurrent was, the better the inhibition efficiency was. When the mass ratio (PASP: Na2WO4) was 3:1, the combined use increased photocurrent less than their individual use did, the inhibition effect decreased. AC impedance measurement results were well agreed to the photo-electrochemical results.

Key words: Photoelectrochemistry, PASP, Na2WO4, Cupronickel B10, Inhibitor