石墨烯氧化程度对Ni(OH)2赝电容性能的影响

doi:10.3866/PKU.WHXB201312233

Abstract

Abstract:

We designed a series of models of reduced graphene oxide sheets (rGNOs) with different oxidation degrees and then studied the interactions between oxidation defects on rGNOs and nickel hydroxide (Ni(OH)₂) using density functional theory (DFT). The adsorption energy between the oxygen-containing groups on rGNOs and Ni(OH)₂ is dependent on the oxidation degree of rGNOs. The variations of atomic distances and charge distribution of the oxide-defected graphene after absorbing Ni(OH)₂ suggested that the oxygen-containing groups on rGNOs improve the characteristics of Ni(OH)₂ as a pseudocapacitor. These theoretical results agree well with available experimental observations and give an explanation for some experimental results. We also introduce a simple potentiostatic electrodeposition method, with which Ni(OH)₂ nanoparticles about 5 nm in diameter were effectively dispersed on the substrate via induction of oxidation defects on rGNOs. In the fabrication of Ni(OH)₂/rGNOs, electrochemical reduction of graphene oxide is the key process. The stronger adsorption results in Ni(OH)₂/rGNOs have higher rate pseudocapacitance (1591 F·g^-1 at 5 mV·s^-1) compared with that of Ni(OH)₂ on bare nickel (656 F·g^-1 at 5 mV·s^-1). The variations of the geometries and charge distributions of the rGNOs after absorbing Ni(OH)₂ lead to the lower equivalent series resistance and better frequency response of Ni(OH)₂/rGNOs than Ni(OH)₂/Ni. The high capacitance of Ni(OH)₂/rGNOs indicates that Ni(OH)₂/rGNOs have the potential of being used as the electrode material of pseudocapacitors.

Key words: Nickel hydroxide, Oxidation defect, Atomic distance, Charge distribution, Adsorption energy, Pseudocapacitance

HE Yuan-Yuan, ZHANG Jin-Jiang, ZHAO Jian-Wei. Influence of Graphene with Different Oxidation Degrees on Nickel Hydroxide Pseudocapacitor Characterization[J]. Acta Phys. -Chim. Sin. 2014, 30(2), 297-304. doi: 10.3866/PKU.WHXB201312233

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Influence of Graphene with Different Oxidation Degrees on Nickel Hydroxide Pseudocapacitor Characterization

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