物理化学学报 >> 1985, Vol. 1 >> Issue (03): 215-221.doi: 10.3866/PKU.WHXB19850305

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用正电子湮没寿命谱法研究电沉积镍结构缺陷

姚士冰; 陈荣钦; 方江陵; 陈秉彝; 钟灿兴; 周绍民   

  1. 厦门大学化学系和物理化学研究所
  • 收稿日期:1984-11-06 修回日期:1900-01-01 发布日期:1985-06-15

STUDIES ON DEFECT OF Ni ELECTRODEPOSITS BY MEANS OF POSITRON ANNIHILATION LIFETIME SPECTROSCOPY

Yao Shibing; Chen Rongqin; Fang Jianlin; Chen Binyi; Zhong Chanxing; Zhou Shaomin   

  1. Chem. Dept.; Phys. Chem. Inst. and Phys. Dept.; Xiamen University
  • Received:1984-11-06 Revised:1900-01-01 Published:1985-06-15

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摘要： 应用正电子湮没寿命谱研究了十二种典型镍镀层的结构缺陷。根据电沉积镍含有杂质的特点, 采用四态模型对寿命谱进行理论分析。
利用寿命谱二组分拟合结果计算了未退火试样的类空位和类微洞的浓度。
研究了第10号试样的退火行为, 根据有关的湮没参数与退火温度的关系曲线, 推断出镀层中的氢既以吸附态形式存在于微洞也以固溶态的形式存在于空位, 同时也观察到在退火过程中空位热迁移并入微洞和镀层杂质发生化学聚团作用的现象。

Abstract: Nickel, electrodeposited from twelve typical plating baths, were investigated by positron annihilation lifetime spectroscopy. In view of the impurity presented in Ni deposits, the theoretical analysis was based on four state trapping model.
The estimation of concentration of vacancy-like and void-type defect of as-deposited sample, as a function of the annihilation parameters, was obtained from twocomponent fitting.
The annealing behavior of sample No.1O had been studied. Based on the resulting curves of an...