物理化学学报 >> 1993, Vol. 9 >> Issue (02): 211-217.doi: 10.3866/PKU.WHXB19930213

研究论文 上一篇    下一篇

俄歇化学位移及其在表面化学上的应用

朱永法   

  1. 清华大学分析中心，北京 100084
  • 收稿日期:1991-12-17 修回日期:1992-07-06 发布日期:1993-04-15
  • 通讯作者: 朱永法

AES Chemical Shift and Application on Surface Chemistry

Zhu Yong-Fa   

  1. Analysis Center, Tsinghua University, Beijing 100084
  • Received:1991-12-17 Revised:1992-07-06 Published:1993-04-15
  • Contact: Zhu Yong-Fa

PDF

4081

赞

摘要： 从俄歇电子激发过程讨论了化学位移和元素化合价以及电负性的关系, 提供了常用元素在不同化合物中的俄歇电子动能及化学位移数据, 运用俄歇化学位移研究了氧在锌表面的吸附和初始氧化反应, Ti/SiO_2的界面固相反应机理以及摩擦过程中润滑膜的组成和结构.

关键词: 俄歇电子能谱, 化学位移, 表面化学

Abstract: The relationship of AES chemical shift with clement valence and electronegativity is discussed. It has also offered Auger electron kinetic energy and chemical shift data of various compounds. Besides, we apply AES chemical shift to study the adsorption of oxygen on zinc. This method can distinguish the states of zinc and oxygen. The interface reaction mechanism of Ti/SiO_2 during RTA treatment was explained with this method and the structure of lubrication film can be studied by AES.

Key words: AES(Auger electron spectroscopy), Chemical shift, Surface chemistry