氢氟酸腐蚀对α-Fe2O3薄膜光解水电极光电化学性质的影响

doi:10.3866/PKU.WHXB201404282

物理化学学报 >> 2014, Vol. 30 >> Issue (6): 1099-1106.doi: 10.3866/PKU.WHXB201404282

氢氟酸腐蚀对α-Fe₂O₃薄膜光解水电极光电化学性质的影响

胡玉祥, 姜春香, 方亮, 郑分刚, 董雯, 苏晓东, 沈明荣

苏州大学物理与光电·能源学部, 江苏省重点薄膜实验室, 江苏苏州215006

收稿日期:2014-03-21 修回日期:2014-04-25 发布日期:2014-05-26
通讯作者: 沈明荣 E-mail:mrshen@suda.edu.cn
基金资助:
国家自然科学基金（91233109）和江苏省高校优势学科项目资助

Effect of HF Treatment on the Photoelectrochemical Properties of a Hematite Thin Film Photoanode for Water Splitting

HU Yu-Xiang, JIANG Chun-Xiang, FANG Liang, ZHENG Fen-Gang, DONG Wen, SU Xiao-Dong, SHEN Ming-Rong

Jiangsu Key Laboratory of Thin Films and College of Physics, Optoelectronics and Energy, Soochow University, Suzhou 215006, Jiangsu Province, P. R. China

Received:2014-03-21 Revised:2014-04-25 Published:2014-05-26
Contact: SHEN Ming-Rong E-mail:mrshen@suda.edu.cn
Supported by:
The project was supported by the National Natural Science Foundation of China (91233109) and Project Funded by the Priority Academic Program Development of Jiangsu Higher Education Institutions, China.

摘要/Abstract

摘要：

使用溶胶-凝胶法制备了α-Fe₂O₃薄膜，研究了氢氟酸腐蚀薄膜表面对其光电化学性质的影响. 实验发现，薄膜表面的孔洞和间隙随着氢氟酸浸蚀时间的增长而发生变化. 氢氟酸浸蚀5 min，α-Fe₂O₃电极的光电流降低；随后随浸蚀时间增加而迅速增加；当浸蚀时间大于15 min时，其光电流再次下降，但对浸蚀过的样品再次退火可以使光电流大幅增加. 通过电化学交流阻抗谱、拉曼和X射线光电子能谱分析，提出了两个影响光电流的因素：氢氟酸表面浸蚀造成薄膜表面的多孔性和结晶度降低. 为此，通过示意图解释了结合浸蚀和退火后处理两个步骤来增强α-Fe₂O₃薄膜光解水电极光电活性的原理. 相对于初始的α-Fe₂O₃电极，浸蚀并且再退火处理后,其光电性质更加稳定.

关键词: α-Fe₂O₃光电极, 表面处理, 光电化学性质

Abstract:

The effects of HF treatment on the photoelectrochemical (PEC) properties of sol-gel prepared hematite (α-Fe₂O₃) thin films were investigated. Pores and interstices between the grains developed on the film surface as the HF etching time increased. The photocurrent density of the α-Fe₂O₃ photoanode decreased within the first 5 min of etching, and then increased quickly as the etching time increased. At longer time than 15 min the photocurrent density deteriorated. Re-annealing the etched samples significantly enhanced the photocurrent density. Based on electrochemical impedance spectroscopy, Raman and X-ray photoelectron spectroscopies, we propose that two factors contribute to photocurrent density reversely: the porosity and the lowered crystallinity of the α-Fe₂O₃ surface because of HF treatment.Aschematic model was compiled to explain the enhanced PEC activities of the etched plus re-annealed α-Fe₂O₃ photoanode. The PEC and water splitting measurements showed that the etched plus re-annealed photoanode is more stable than the as-prepared one.

Key words: α-Fe₂O₃ photoelectrode, Surface treatment, Photoelectrochemical property

胡玉祥, 姜春香, 方亮, 郑分刚, 董雯, 苏晓东, 沈明荣. 氢氟酸腐蚀对α-Fe₂O₃薄膜光解水电极光电化学性质的影响[J]. 物理化学学报, 2014, 30(6), 1099-1106. doi: 10.3866/PKU.WHXB201404282

HU Yu-Xiang, JIANG Chun-Xiang, FANG Liang, ZHENG Fen-Gang, DONG Wen, SU Xiao-Dong, SHEN Ming-Rong. Effect of HF Treatment on the Photoelectrochemical Properties of a Hematite Thin Film Photoanode for Water Splitting[J]. Acta Phys. -Chim. Sin. 2014, 30(6), 1099-1106. doi: 10.3866/PKU.WHXB201404282

链接本文: https://www.whxb.pku.edu.cn/CN/10.3866/PKU.WHXB201404282

https://www.whxb.pku.edu.cn/CN/Y2014/V30/I6/1099

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氢氟酸腐蚀对α-Fe₂O₃薄膜光解水电极光电化学性质的影响

Effect of HF Treatment on the Photoelectrochemical Properties of a Hematite Thin Film Photoanode for Water Splitting

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