物理化学学报 >> 1996, Vol. 12 >> Issue (10): 939-942.doi: 10.3866/PKU.WHXB19961017

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化学气相沉积对Pt/KL沸石芳构化性能的影响

郑坚,淳远,董家禄,须沁华   

  1. 南京大学化学化工学院，南京 210093
  • 收稿日期:1995-11-20 修回日期:1996-06-17 发布日期:1996-10-15
  • 通讯作者: 须沁华

Effect of Chemical Vapour Deposition on Pt/KL Catalyst for the Aromatization of n-Hexane

Zheng Jian,Chun Yuan,Dong Jia-Lu,Xu Qin-Hua   

  1. Department of Chemsitry,Nanjing University,Nanjing 210093
  • Received:1995-11-20 Revised:1996-06-17 Published:1996-10-15
  • Contact: Xu Qin-Hua

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关键词: 化学气相沉积, KL沸石, 载Pt催化剂, 正已烷芳构化, 硫中毒

Abstract:

 Modification of KL zeolite by chemical vapour deposition (CVD) of Si(OEt)4 and (CH3)3SiOSi(CH3)3 was used to study the influence of zeoltie support on the aromatization of n-hexane over Pt/KL catalyst. The pore size and pore volume of zeolite were decreased by CVD. The acidic hydroxyl groups remaining on the surface of KL zeolite were removed and thus the selectivity of non-acidic catalyzed aromatization reaction was improved. Whereas the activity of aromatiztion reaction was decreased due to the destruction of some of active sites in KL zeolite for 1,6-cyclization. Becuase of the coverage of the framework of zeolite by CVD of SiO2, Pt particles became more electron-excess. Therefore, the silica-coated catalysts were easier to be poisoned by sulphur.

Key words: Chemical vapour deposition, KL zeolite, Pt supported, Armoatization of n-hexane, Sulphur poisoning