掺铜二氧化钛光催化剂的XPS研究

doi:10.3866/PKU.WHXB20031017

Acta Phys. -Chim. Sin. ›› 2003, Vol. 19 ›› Issue (10): 967-969.doi: 10.3866/PKU.WHXB20031017

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XPS Study of Copper Doping TiO₂ Photocatalyst

Wu Shu-Xin;Ma Zhi;Qin Yong-Ning;He Fei;Jia Li-Shan;Zhang Yan-Jun

School of Chemical Engineering and Technology，Tianjin University； United Institute of Nankai University and Tianjin University； State Key Laboratory of C1 Chemical Technology of Tianjin University, Tianjin　300072

Received:2003-03-24 Revised:2003-05-30 Published:2003-10-15
Contact: Qin Yong-Ning E-mail:qin-yongning@263.net

Abstract

Abstract: The copper doped titanium dioxide was prepared by immersion method. Photocatalytic activity was investigated with acetic acid as a model reactant, and the photocatalyst was analyzed by means of XPS. The enhanced degradation rate of acetic acid is attributed to increased charge separation and interfacial charge-transfer rate on the surface of the doped photocatalyst.

Key words: Photocatalytic oxidation, Acetic acid, Copper ion doping, Titanium dioxide, XPS

Wu Shu-Xin;Ma Zhi;Qin Yong-Ning;He Fei;Jia Li-Shan;Zhang Yan-Jun. XPS Study of Copper Doping TiO₂ Photocatalyst[J]. Acta Phys. -Chim. Sin. 2003, 19(10), 967-969. doi: 10.3866/PKU.WHXB20031017

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XPS Study of Copper Doping TiO₂ Photocatalyst

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XPS Study of Copper Doping TiO₂ Photocatalyst