物理化学学报 >> 2001, Vol. 17 >> Issue (03): 206-209.doi: 10.3866/PKU.WHXB20010304

研究论文 上一篇    下一篇

二甲基甲酰胺中钬镍合金的电沉积

王宇;刘冠昆;何凤荣;童叶翔   

  1. 中山大学化学与化学工程学院，广州　510275
  • 收稿日期:2000-07-19 修回日期:2000-10-21 发布日期:2001-03-15
  • 通讯作者: 刘冠昆 E-mail:ceslgk@zsulink.zsu.edu.cn

Electrodeposition of Ho-Ni Alloy from Dimethyformamide Bath

Wang Yu;Liu Guan-Kun;He Feng-Rong;Tong Ye-Xiang   

  1. Faculty of Chemistry and Chemical Engineering, Zhongshan University, Guangzhou 　510275, China
  • Received:2000-07-19 Revised:2000-10-21 Published:2001-03-15
  • Contact: Liu Guan-Kun E-mail:ceslgk@zsulink.zsu.edu.cn

PDF

2776

赞

摘要： 研究了在二甲基甲酰胺(DMF)体系中钬的电还原及钬与镍的电解共沉积.结果表明，由 于微量水在电极上还原形成不溶的导电性差的膜层，使钬单独沉积很困难.恒电位电解用于 制备钬镍合金， EDAX,SEM和XRD用于分析镀层，得到了黑色粘附性好的非晶态钬镍合金镀层 ，钬的含量可高达72.7％.

关键词: 稀土, 恒电位电解, 二甲基甲酰胺, 钬镍合金

Abstract: Cyclic voltammetry was used to study the electroreduction of Ho(III) i n Ho(NO3)3LiClO4DMF. The results showed that traces of water in this system blocked the electroreduct ion of Ho(III) by forming LiOH and Ho(OH)3 films on the electrode surface. Cod eposition of Ho and Ni was studied in dimethylformamide by cyclic voltammetry an d potentiostatic deposition at room temperature. Potentiostatic deposition was u sed to prepare HoNi alloys. EDAX, SEM and XRD were used to analyze the films. The results indicated that black, adhesive and amorphous HoNi alloy films on C u were produced where the content of Ho could be as high as 72.7 ％.

Key words: Rare earths, Potentiostatic deposition, Dimethylformamide, Ho-Ni alloy