Acta Phys. -Chim. Sin. ›› 1999, Vol. 15 ›› Issue (08): 764-768.doi: 10.3866/PKU.WHXB19990819

• Note • Previous Articles    

Quantitative Measurement of Adsorption of CH3OH on Commonly Used Mterials by Photoacoustic Method

Deng Guo-Yang, Jes Henningsen   

  1. Zhongnan Institute of Technology,Hengyang 421001|Danish Institute of Fundamental Metrology,Copenhagen,Denmark
  • Received:1998-12-08 Revised:1999-04-05 Published:1999-08-15
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Abstract:

 A photoacoustic method to quantitatively measure the adsorption of CH_3OH on gas-solid interface is presented. The adsorption of CH_3OH on such commonly used materials as quartz, pyrex, polytetrafluoroethylene teflon, petheoroalcoxy teflon and polished stainless steel SS316 is measured. Kinetic simulation can explain the experimental results, thus providing a basis for the generalization of the experimental results. The adsorption property of the materials at reduced temperature is also studied.

Key words: Photoacoustic method, Adsorption, Methyl alcohol