物理化学学报 >> 2001, Vol. 17 >> Issue (10): 931-935.doi: 10.3866/PKU.WHXB20011013

研究简报 上一篇    下一篇

硅表面上构筑具有化学特性的图形的新方法

吴瑞阁;欧阳贱华;赵新生;黄小华;黄惠忠;吴念祖   

  1. 分子动态与稳态结构国家重点实验室 北京大学物理化学研究所，北京　100871
  • 收稿日期:2001-02-19 修回日期:2001-04-30 发布日期:2001-10-15
  • 通讯作者: 赵新生 E-mail:zhaoxs@chem.pku.edu.cn

A New Method to Pattern Silicon Surface with Chemical Functional Groups

Wu Rui-Ge;Ouyang Jian-Hua;Zhao Xin-Sheng;Huang Xiao-Hua;Huang Hui-Zhong;Wu Nian-Zu   

  1. State Key Laboratory of Molecular Dynamic and Stable Structures, Institute of Physical Chemistry, Peking University, Beijing　100871
  • Received:2001-02-19 Revised:2001-04-30 Published:2001-10-15
  • Contact: Zhao Xin-Sheng E-mail:zhaoxs@chem.pku.edu.cn

PDF

3070

赞

摘要： 为了在硅基底上得到不同化学基团修饰的图形，在氢终止硅（111）表面运用光刻技术和光化学反应结合来控制表面成膜反应的位置，并用AFM、XPS、接触角测定等验证了这种方法的可行性.

关键词: 单层膜, 分子构筑, 光刻, 图形, 硅表面

Abstract: Hydrogenterminated silicon surface was found to react with 1alkenes to produce stable monolayers. To pattern such monolayers and create surfaces with regions of different chemical functionalities, we used the combination of the photolithography and the light induced alkylation. The surfaces had been characterized by XPS, AFM, and contact angel measurement. It is shown that this procedure can be used to prepare micropatterns of chemical functional groups on silicon substrate.

Key words: Monolayers, Molecular architecture, Photolithograph, Pattern, Silicon surface