关键词: 电沉积, 超晶格, 多层膜, 巨磁电阻（GMR）, 结构

Abstract: Cu/Co superlattice multilayer were prepared on the p-type Si substrate by electrochemical deposition. The cross-section profile of the multilayer was examined by SEM.XRD analysis indicates that the multilayers grow epitaxially when the modulate wavelength (λ) ranges 20 nm to 160 nm. Further decrease of λ, the epitaxial growth becomes more prominent. When λ is smaller than 20 nm, satellite peaks in the XRD patterns indicate that the multilayer has formed a superlattice structure. In addition, the GMR performance of the multilayers increases with the increase of the number of periods and keeps steady when the number of periods is above 300,that is to say, its effect on GMR performance can be ignored.

Key words: Electrodeposition, Superlattice, Multilayer, Giant magnetoresistance (GMR), Structure