Acta Phys. -Chim. Sin. ›› 2006, Vol. 22 ›› Issue (03): 378-382.doi: 10.3866/PKU.WHXB20060325

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The Preparation of Copper Electrodeposits with (110) Lattice Plane Fully Preferred Orientation

GU Min; XIAN Xiao-Hong   

  1. Key Laboratory for the Exploitation of Southwestern Resources and the Environmental Disaster Control Engineering of Education Ministry; College of Chemistry and Chemical Engineering , Chongqing University, Chongqing 400044, P. R. China
  • Received:2005-07-14 Revised:2005-11-03 Published:2006-03-10
  • Contact: XIAN Xiao-Hong

Abstract: The electrodeposition conditions for the preparation of copper deposits with fully preferred orientation were investigated in detail. XRD results of copper electrodeposits showed that texture with (110) could be improved by either polyethylene glycol (PEG) or chloride ions. However, the presence of the both additives resulted in a fully preferred orientation of (110) plane because of the strong synergistic effect between PEG and Cl-. The strong adsorption of PEG and Cl- on different lattice planes of different grains was thought to be responsible for the preferential growth. The microstress of the copper deposits with fully preferred orientation was small which indicated that the deposits were stable. The influence of PEG and Cl- on the copper electrodeposition had also been studied.

Key words: Electrodeposition, Copper electrodeposits, Fully preferred orientation, Microstress