大气压射频等离子体化学气相沉积TiO2体系的发射光谱诊断

doi:10.3866/PKU.WHXB201212271

Abstract

Abstract:

Diagnosis of emission spectroscopy on chemical vapor deposition (PCVD) of TiO₂ with atmospheric-pressure radio frequency (RF) plasma was studied. The dependences of relative intensity of atomic oxygen line, Ar excitation temperature, OH rotational and vibrational temperatures were investigated on partial pressures of O₂ and titanium tetraisopropoxide (TTIP) and input power, respectively. The relative intensity of the atomic oxygen line rapidly increased to a maximum and slowly decreased with increasing O₂ partial pressure. OH vibrational temperature gradually increased, whereas Ar excitation temperature and OH rotational temperature showed little change. The relative intensity of the atomic oxygen line decreased, Ar excitation temperature remained constant, and OH vibrational and rotational temperatures increased with increasing TTIP partial pressure. The relative intensity of atomic oxygen line decreased, whereas the Ar excitation temperature and OH vibrational and rotational temperatures increased with increasing input power.

Key words: Atmospheric-pressure radio frequency plasma, Dielectric barrier discharge, Plasma chemical vapour deposition, Diagnosis of optical emission spectrum, TiO₂

CHANG Da-Lei, LI Xiao-Song, ZHAO Tian-Liang, ZHU Ai-Min. Diagnosis of Emission Spectra on Chemical Vapor Deposition of TiO₂ System with Atmospheric-Pressure Radio Frequency Plasma[J].Acta Phys. -Chim. Sin., 2013, 29(03): 625-630.

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Diagnosis of Emission Spectra on Chemical Vapor Deposition of TiO₂ System with Atmospheric-Pressure Radio Frequency Plasma

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Diagnosis of Emission Spectra on Chemical Vapor Deposition of TiO2 System with Atmospheric-Pressure Radio Frequency Plasma

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Diagnosis of Emission Spectra on Chemical Vapor Deposition of TiO₂ System with Atmospheric-Pressure Radio Frequency Plasma