用正电子湮没寿命谱法研究锡镀层缺陷

doi:10.3866/PKU.WHXB19910217

Acta Phys. -Chim. Sin. ›› 1991, Vol. 7 ›› Issue (02): 215-218.doi: 10.3866/PKU.WHXB19910217

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STUDY ON THE STRUCTURE DEFECT OF ELECTRODEPOSITED TIN USING POSITRON ANNIHILATION LIFETIME SPECTROSCOPY

Yao Shi-Bing; Liu Zan-Jin; Zhou Shao-Min; Fang Jiang-Ling

Chemistry Department, Xiamen University, Xiamen 361005; Physics Department, Xiamen University

Received:1989-12-13 Revised:1990-04-20 Published:1991-04-15
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Abstract

Abstract:

The structure defect of electrodeposited tin was investigated by means of positron annihilation lifetime spectroscopy. It was observed that when annealing temperatures were less than 120 ℃, the vacancies aggregated into a cluster; in the region of 120 —160 ℃, the structure defects changed considerably, some vacancy cluster enlarged and some shrunk due to thermal migration of the atoms; the recrystallization of deposits took place in temperature of 180 ℃, in this case the positrons were premarily annihilated in the expanded crystal boundary.

Key words: Electrodeposited tin, Defect, Positron, Recrystallization

Yao Shi-Bing; Liu Zan-Jin; Zhou Shao-Min; Fang Jiang-Ling. STUDY ON THE STRUCTURE DEFECT OF ELECTRODEPOSITED TIN USING POSITRON ANNIHILATION LIFETIME SPECTROSCOPY[J]. Acta Phys. -Chim. Sin. 1991, 7(02), 215-218. doi: 10.3866/PKU.WHXB19910217

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STUDY ON THE STRUCTURE DEFECT OF ELECTRODEPOSITED TIN USING POSITRON ANNIHILATION LIFETIME SPECTROSCOPY

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