Acta Phys. -Chim. Sin. ›› 1996, Vol. 12 ›› Issue (05): 436-439.doi: 10.3866/PKU.WHXB19960510

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Preparation of Nickel Phosphorous Amorphous Film Catalyst by Electrodeposition on ρ-type Silicon

Guo Yong,Zhang Guo-Qing,Yao Su-Wei,Guo He-Tong,Gong Zheng-Lie   

  1. Department of Applied Chemistry,Tianjin University,Tianjin 300072|Department of Physics,Tianjin Institute of Technology,Tianjin 300191
  • Received:1995-07-19 Revised:1995-11-10 Published:1996-05-15
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Abstract:

Nickel phosphorous amorphous film catalyst was prepared by means of electrodeposition on p-type silicon. Effects of H3PO3 content in bath and current density on phosphorous content in the film were studied. With the increase of H3PO3 concentration and the decrease of current density, P content was increased remarkably, X-ray diffraction (XRD) showed that the film containning x (molar fraction)=0.109 P is amorphous. Scanning electronic microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) were used to investigate the morphology of the film and the chemical state of Ni, P, O on the surface.

Key words: ρ-Si, Amorphous, Ni-P, Catalyst, Electrodeposition