物理化学学报 >> 1991, Vol. 7 >> Issue (02): 215-218.doi: 10.3866/PKU.WHXB19910217

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用正电子湮没寿命谱法研究锡镀层缺陷

姚士冰; 刘赞今; 周绍民; 方江陵   

  1. 厦门大学化学系, 物理化学研究所 厦门 361005; 厦门大学物理学系
  • 收稿日期:1989-12-13 修回日期:1990-04-20 发布日期:1991-04-15
  • 通讯作者:

STUDY ON THE STRUCTURE DEFECT OF ELECTRODEPOSITED TIN USING POSITRON ANNIHILATION LIFETIME SPECTROSCOPY

Yao Shi-Bing; Liu Zan-Jin; Zhou Shao-Min; Fang Jiang-Ling   

  1. Chemistry Department, Xiamen University, Xiamen 361005; Physics Department, Xiamen University
  • Received:1989-12-13 Revised:1990-04-20 Published:1991-04-15
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关键词: 锡镀层, 缺陷, 正电子, 再结晶

Abstract:

The structure defect of electrodeposited tin was investigated by means of positron annihilation lifetime spectroscopy. It was observed that when annealing temperatures were less than 120 ℃, the vacancies aggregated into a cluster; in the region of 120 —160 ℃, the structure defects changed considerably, some vacancy cluster enlarged and some shrunk due to thermal migration of the atoms; the recrystallization of deposits took place in temperature of 180 ℃, in this case the positrons were premarily annihilated in the expanded crystal boundary.

Key words: Electrodeposited tin, Defect, Positron, Recrystallization